Block copolymer enables sub-8 nm line widths in semiconductor manufacturing
Scientists at Tokyo Institute of Technology (Tokyo Tech) and Tokyo Ohka Kogyo (TOK) have developed a novel block copolymer that could significantly enhance semiconductor miniaturization. This newly engineered polymer is capable of arranging itself into lamellar structures with a half-pitch width of just 7.6 nanometers, surpassing the capabilities of conventional block copolymers and pushing the